One embodiment disclosed relates to a charged-particle beam apparatus configured with sample charging control. A stage is configured to hold a sample, and a column for generating a charged-particle beam and for directing the beam to an area of the sample. A light beam is generated by an irradiation source and is directed to the area. Bias circuitry is configured to apply a stage bias voltage such that an electric field is created with respect to the sample. Control circuitry is coupled to the irradiation source and to the bias circuitry. The control circuitry is configured to direct the light beam onto the area at a same time as the stage bias voltage is applied to the sample. Other embodiments are also disclosed.