Polymerizable fluorinated ester compounds having formula (1) or (2) are novel wherein R.sup.1 is H, methyl or trifluoromethyl, R.sup.2 is a divalent hydrocarbon group, R.sup.3 is H or a monovalent hydrocarbon group, or R.sup.2 and R.sup.3, taken together, may form a ring, R.sup.4 is H, OH or a monovalent hydrocarbon group, and R.sup.5 is an acid labile group. They are most useful as monomers to produce polymers for the manufacture of radiation-sensitive resist compositions ##STR00001##