A positive resist composition comprising: (A1) a resin containing at least one type of repeating unit represented by the specific formula and additionally containing at least one type of repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound which is capable of generating an acid by the action of actinic ray or radiation.

 
Web www.patentalert.com

> Method of forming a photoresist pattern and method for patterning a layer using a photoresist

~ 00337