Compact and integral arrangements for an energy-conditioning arrangement (800q) having various predetermined pathways (813a, 813b) utilized in part for the purpose of conditioning energies of either one or multiple of circuitry that would otherwise detrimentally effect a predetermined application having a single or multiple, circuitry systems. Some energy-conditioning variants can be operable to provide multiple-conditioning operations.

 
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> Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage

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