A copolymer for imparting repellency and stain resistance to substrates is disclosed of Formula 1 [R.sub.f--X.sub.1-A-X.sub.1--Y--C(O)--CZCH.sub.2].sub.m--[W.sub.q].sub.p Formula 1 wherein R.sub.f is a straight or branched perfluoroalkyl group having from about 2 to about 20 carbon atoms, or a mixture thereof, which is optionally interrupted by at least one oxygen atom, each X.sub.1 is independently an organic divalent linking group having from about 1 to about 20 carbon atoms, optionally containing a triazole, oxygen, nitrogen, or sulfur, or a combination thereof, A is a 1,2,3-triazole, Y is O or N(R).sub.2 wherein R is H or C.sub.1 to C.sub.20 alkyl, Z is H, a straight or branched alkyl group having from about 1 to about 4 carbon atoms, or halide, m is a positive integer, q is zero or a positive integer, p is zero or a positive integer, and W is or [R.sup.1--X.sub.1--Y--C(O)--CH.sub.2Z], wherein X.sub.1, Y, and Z are as defined above, Rx is C(O)O(R.sup.1), C(O)N(R.sup.2).sub.2, OC(O)(R.sup.1), SO.sub.2(R.sup.1), C.sub.6(R.sup.3).sub.5, O(R.sup.1), halide, or R.sup.1; each R.sup.1 is independently H, C.sub.nH.sub.2n+1, C.sub.nH.sub.2n--CH(O)CH.sub.2, [CH.sub.2CH.sub.2O].sub.iR.sup.4, [C.sub.nC.sub.2n]N(R.sup.4).sub.2 or [C.sub.nH.sub.2n]C.sub.nF.sub.2n+1, n is 1 to 40, R.sup.4is H or C.sub.sH.sub.2s+1, s=0 to 40, i=1 to 200, each R.sup.2 is independently H, or C.sub.tH.sub.2t+1 wherein t is 1 to 20, each R.sup.3 is independently H, COOR.sup.1, halogen, N(R.sup.1).sub.2, OR.sup.1, SO.sub.2NHR.sup.1, CH.dbd.CH.sub.2, or SO.sub.3M, M is H, alkali metal salt, alkaline earth metal salt, or ammonium.