In this developing method and apparatus, a concentration measuring unit
222 picks part of developing fluid in a blending tank 186 to measure the
resist concentration by an absorption photometry and feeds the detected
resist concentration to a control unit 240. The control unit 240 controls
respective valves 210, 212, 216 of a TMAH concentrate solution 200, a
solvent pipe 204 and a drain pipe 208 in a manner that the developing
fluid in the blending tank 186 has a TMAH concentration corresponding to
a measured resist-concentration value to accomplish a constant developing
rate, performing component control of the developing fluid. The
developing fluid transferred from the blending tank 186 to a supply tank
188 is fed to a developer nozzle DN in a developing section 126 through a
developer pipe 224 owing to the drive of a pump 228. Accordingly, even if
the developing fluid is reused in the developing process in multiple
times, it is possible to make sure of the uniformity in development.