An exposure apparatus includes a projection optical system for projecting
an image of a pattern of a reticle onto an object, via a fluid that is
filled in a space between said projection optical system and the object,
a vibrator part for vibrating at least one of the fluid, the object, and
the projection optical system, and a controller for controlling the
vibrator part so that the vibration of at least one of the fluid, the
object, and the projection optical system becomes a tolerance during a
processing of the object.