A method for preparing a specimen for application of microanalysis thereto
includes forming an initial conductive layer over a defined area of
interest on a semiconductor substrate, the initial conductive layer
formed through an electron beam deposition process. A volume of substrate
material surrounding the area of interest is removed, thereby forming the
specimen, including said area of interest and said initial conductive
layer over the area of interest. The specimen is then removed from the
bulk substrate material.