An exposure apparatus for exposing a substrate to a pattern. The apparatus includes a stage configured to hold the substrate and to move, a driving unit configured to drive the stage, a plurality of cameras, each of the plurality of cameras being configured to sense an image of a mark for alignment of the substrate, the plurality of cameras including at least two cameras of which specifications are different from each other, a camera controller configured to supply a sync signal common to the plurality of cameras, to cause the plurality of cameras to execute image sensing based on the common sync signal, and to measure position of the mark based on the sensed image, and a drive controller configured to control the driving unit based on information provided by the camera controller. The common sync signal includes a common horizontal sync signal having a first horizontal period. One of the at least two cameras includes an image sensing element having a specification in which the image sensing element operates in accordance with a horizontal sync signal having a second horizontal period, and the one camera drives the image sensing element in accordance with the common horizontal sync signal by using, as one horizontal period, at least a common multiple of the first and second horizontal periods.