A system for monitoring wafer throughput per hour in a wafer furnace
includes a database, an analysis unit, a comparison unit, and an output
unit. The database includes two or more operation histories of the wafer
furnace. The analysis unit is coupled to the database. The analysis unit
includes logic that retrieves at least one operation history from the
database, determines a standard process time and a specification range
for the retrieved operation history, and receives a current process time
for the current process. The comparison unit, which is coupled to the
analysis unit, includes logic that compares the standard process time and
the specification range to the current process time. The output unit,
which is coupled to the comparison unit, includes logic that outputs a
comparison result. A method for monitoring wafer throughput per hour in a
wafer furnace also is described.