An end-effector includes multiple vortex chucks for supporting a wafer.
Vortex chucks are located along the periphery of the end-effector to help
prevent a flexible wafer from curling. The end-effector has limiters to
restrict the lateral movement of a supported wafer. In one example, the
end-effector has a detector for detecting the presence of a wafer. The
detector is mounted at a shallow angle to allow the end-effector to be
positioned close to a wafer to be picked-up, thereby allowing detection
of deformed wafers contained in a wafer cassette. The shallow angle of
the detector also minimizes the thickness of the end-effector. Also
disclosed is a wafer station with features similar to that of the
end-effector.