An exposure apparatus for projecting and transferring a pattern on a master onto a surface of a target exposure object by radiation exposure, including a radiation generating unit for generating radiation having a plurality of different wavelengths, and a wavelength selecting unit for selecting a wavelength of the radiation generated by the radiation generating unit. The wavelength selecting unit acquires information on the pattern on the master, and selects a wavelength on the basis of wavelength information or wavelength distribution information contained in the acquired information.