An exposure apparatus having an illumination optical unit for emitting exposure light, a stage for supporting a substrate, and a main controller for controlling exposure operation of transferring a pattern formed on a master to the substrate. The apparatus includes a controller for controlling a Peltier element on the basis of an operation control signal from the main controller, and controlling heat movement by the Peltier element, the Peltier element being set at or near an object to be temperature-controlled in real time.