This invention provides a positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant, used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. It is a positive photosensitive siloxane composition comprising a siloxane polymer, quinonediazide compound and solvent, characterized in that the light transmittance of the cured film formed of the composition per 3 .mu.m of film thickness at a wavelength of 400 nm is 95% or more.

 
Web www.patentalert.com

< High resolution resists for next generation lithographies

< Photosensitive composition and color paste

> Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel

> Lithographic printing plate precursor, plate-making method, and lithographic printing method

~ 00265