Systems and methods are provided for delivering solid precursors. In certain embodiments of the present application, a flow monitor is used to measure and regulate the flow of vaporized solid precursor material from a vaporization chamber to a deposition chamber. The flow monitor chokes the supply of vapor into the deposition chamber to regulate vapor flow. To avoid condensation of the solid precursor material in the delivery lines or flow monitor, a controller is placed in a feed back loop to monitor the flow rate and make adjustments to the amount of vapor available at the inlet of the flow monitor. Additional embodiments are disclosed and claimed.