A positive photoresist composition comprising:

    • (A) an oxime sulfonate compound represented by the specific formula,
    • (B) a resin comprising repeating units including a group represented by the specific formula and which increases the solubility in an alkaline developing solution by the action of an acid, and
    • (C) a fluoroaliphatic-group-containing polymeric compound containing repeating units derived from a monomer represented by the specific formula.
  •  
    Web www.patentalert.com

    < Ink for jet recording and ink set

    < Oolong tea beverage and process of producing the same

    > Silver halide photographic light-sensitive material

    > Method of increasing neutrophil production using optically-pure (R)-2,3-benzodiazepines

    ~ 00248