A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.

 
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> Method of performing the superposition operation of a Grover's or a Deutsch-Jozsa's quantum algorithm and a relative quantum gate

> Temperature controlled optoelectronic device
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