An integrated circuit having a substrate and a semiconductor device thereon. A
stop layer over the substrate has a first dielectric layer formed thereon having
an opening into which a first conformal barrier is formed. A first conformal barrier
liner is formed in the opening, processed, and treated to improve adhesion. Portions
of the first conformal barrier liner on the sidewalls act as a barrier to diffusion
of conductor core material to the first dielectric layer. A conductor material
is formed in the opening over the vertical portions of the first conformal barrier
liner and the first stop layer.