There is provided a surface emitting semiconductor laser satisfying a requirement of making a transverse mode stable and having characteristics of high output power, low resistance, high efficiency, and high speed response and a method for manufacturing the surface emitting semiconductor laser. Five holes are formed on the top surface of an upper multilayer reflection film formed in the shape of a post by the use of a focused ion beam (FIB) processing unit. One hole is formed on the surface of an upper multilayer reflection film corresponding to the center position of a square current injection region which is about 8 m square and the remaining four holes are formed at the corners of the square current injection region, for example, at the positions about 2 m square away from the one hole to produce four light emitting spots.

 
Web www.patentalert.com

< Ceramic substrate for semiconductor production and inspection devices

< Electro-optical device and semiconductor circuit

> Modified factor VIII

> Fluorine-containing acetophenone derivative, surface layer material containing the same as photo initiator, article with composite hard coat layer, and method for forming composite hard coat layer

~ 00233