A controlled aperture provides an opening through a barrier separating two parts of the apparatus to enable a pulse of radiation to be radiated from one part of the apparatus to the a second part. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow between the first and second parts.

 
Web www.patentalert.com

< Method of producing semiconductor crystal

< Low selectivity deposition methods

> Systems and method for picking and placing of nanoscale objects utilizing differences in chemical and physical binding forces

> High-density FinFET integration scheme

~ 00232