A semiconductor integrated circuit of an aspect of the present invention having a CMOS logic gate including a first MOS transistor of a first conductivity type and a second MOS transistor of a second conductivity type, has a first MOS transistor region in which the first MOS transistor is formed, and a 2ath MOS transistor region and a 2bth MOS transistor region, in each of which the second MOS transistor is formed, separately arranged to be in contact with a first side of said first MOS transistor region and a second side opposite to the first side.

 
Web www.patentalert.com

< Semiconductor device and method for fabricating such device

< Semiconductor device with SOI region and bulk region and method of manufacture thereof

> Integrated device in emitter-switching configuration and related manufacturing process

> Bipolar transistor having self-aligned silicide and a self-aligned emitter contact border

~ 00230