A method of forming a catalyst body by forming a first layer of hemispherical grain polysilicon over a substrate, and oxidizing at least a portion of the first layer to form a second layer of silica. Additionally, forming a third layer of nitride material over the second layer, and forming a catalyst material over the nitride layer, can be performed before annealing to form a catalyst body.

 
Web www.patentalert.com

< Method and apparatus for production of 213Bi from a high activity 225Ac source

< Zinc oxide-based sorbents and processes for preparing and using same

> Method and device for producing globular grains of high-puroty silicon having a diameter of between 50 m and 300 m and use of the same

> Yttrium aluminum garnet powders and processing

~ 00212