Reduced radiation damage to an IC feature is disclosed. At least a portion of the feature which is sensitive to radiation is covered by a radiation protection layer. The radiation protection layer protects the feature from being damaged to radiation during, for example, processing of the IC. In one embodiment, the radiation protection layer comprises a noble metal, oxides, alloys, or compounds thereof.

 
Web www.patentalert.com

< Method for fabricating semiconductor device

< FeRAM capacitor stack etch

> Method for forming thin film

> Nonvolatile semiconductor memory and method of managing information in information distribution system

~ 00210