A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.

 
Web www.patentalert.com

< Oxygen scavenging polymers as active barrier tie layers in multilayered structures

< Paper/film composite structure and making method

> Method of manufacturing III-V group compound semiconductor

> Maleic acid and ethylene urea containing formulation for removing residue from semiconductor substrate and method for cleaning wafer

~ 00209