A magnetoresistance effect element includes a first ferromagnetic layer, insulating layer overlying the first ferromagnetic layer, and second ferromagnetic layer overlying the insulating layer. The insulating layer has formed a through hole having an opening width not larger than 20 nm, and the first and second ferromagnetic layers are connected to each other via the through hole.

 
Web www.patentalert.com

< Miniature three-dimensional contour scanner

< Semiconductor memory device with malfunction prevention device, and portable electronic apparatus using the same

> Method and apparatus for inspecting integrated circuit pattern

> Image forming apparatus

~ 00203