Copolymer structures are formed by exposing a substrate with an imaging
layer thereon to two or more beams of selected wavelengths to form interference
patterns at the imaging layer to change the wettability of the imaging layer in
accordance with the interference patterns. A layer of a selected block copolymer
is deposited onto the exposed imaging layer and annealed to separate the components
of the copolymer in accordance with the pattern of wettability and to replicate
the pattern of the imaging layer in the copolymer layer. Stripes or isolated regions
of the separated components may be formed with periodic dimensions in the range
of 100 nm or less.
