Described are methods for patterning a substrate by imprint lithography.
Imprint lithography is a process in which a liquid is dispensed onto a substrate.
A template is brought into contact with the liquid and the liquid is cured. The
cured liquid includes an imprint of any patterns formed in the template. Alignment
of the template with the substrate is performed prior to curing the liquid. Alignment
of the template with the substrate includes rotational alignment of the template
with respect to the substrate.
