Nitride based semiconductor light emitting device and nitride based semiconductor laser device

   
   

A semiconductor laser device is constructed by stacking a buffer layer, an undoped GaN layer, an n-GaN contact layer, an n-InGaN crack preventing layer, an n-AlGaN cladding layer, a light emitting layer, a p-AlGaN cladding layer, and a p-GaN contact layer in this order. A ridge portion comprising the p-GaN contact layer and the p-AlGaN cladding layer is formed, and the thickness of the p-AlGaN cladding layer in the ridge portion is less than 0.3 m.

 
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< Six to ten KHz, or greater gas discharge laser system

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> Tunable single frequency filter for lasers

> Semiconductor laser and manufacturing method thereof

~ 00191