A photomask for reducing power supply voltage fluctuations in an integrated circuit
and integrated circuit manufactured by the same are disclosed. The photomask includes
a substrate and a patterned layer formed on at least a portion of the substrate.
The patterned layer may be formed using a mask pattern file created by analyzing
a pattern in a mask layout file to identify a region in the pattern to add one
or more decoupling capacitors. Once the region is identified, a feature located
in the identified region is moved based on a design rule from a first position
to a second position in the mask layout file to create a space in the identified
region. The decoupling capacitors are placed in the space in the identified region.
