Photoresist processing aid and method

   
   

A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.

 
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< Non-aqueous electrolytic solution and secondary battery containing same

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> Process for the electrodeposition of low stress nickel-manganese alloys

> Film-sealed non-aqueous electrolyte battery with improved surface-treated lead terminal

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