A method for forming a region of low dielectric constant nanoporous material
is
disclosed. In one embodiment, the present method includes the step of preparing
a microemulsion. The method of the present embodiment then recites applying the
microemulsion to a surface above which it is desired to form a region of low dielectric
constant nanoporous material. Next, the present method recites subjecting the microemulsion,
which has been applied to the surface, to a thermal process such that the region
of low dielectric constant nanoporous material is formed above the surface.
