A method of translating device layout data to a format for a mask writing tool
includes the acts of reading a file defining a number of cells that represent structures
on the device. One or more cells are selected and one or more modified cells based
on the interaction of the selected cells with other cells in the device layout
are created. One or more additional cells is created that will create structures
on the mask that are not formed by writing files corresponding to the modified
cells and areas that prevent extraneous structures from being formed on the mask
at a selected location by the writing of the files corresponding to the modified
cells. A jobdeck for the mask writing tool is created that indicates where the
files corresponding to modified cells and the one or more additional cells should
be written to create one or more masks or reticles.
