Laser beam irradiating apparatus, laser beam irradiating method, and method of manufacturing a semiconductor device

   
   

A laser beam irradiating apparatus capable of achieving uniform annealing efficiently by employing a simple optical system using laser beams having attenuated regions is disclosed. It is possible to provide a method of irradiating a laser beam using the laser beam irradiating apparatus, and to provide a method of manufacturing a semiconductor device including the laser beam irradiating method in the fabrication sequence thereof.

 
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