A semiconductor device has a silicon layer and a first dielectric layer. A transistor
has a drain and a source that are at least partially in the silicon layer. The
transistor further has a gate and a spacer defining the gate. The first dielectric
layer forms the spacer. A capacitor has first and second electrodes, the first
electrode is formed at least partially in the silicon layer, and the first dielectric
layer provides a dielectric for the capacitor between the first and second electrodes.
A resistor has a resistive region formed at least partially in the silicon layer
and has first and second resistor contact areas defined by the first dielectric
layer. A second dielectric layer electrically isolates the transistor, the capacitor,
and the resistor from conductive lines.
