In situ plasma process to remove fluorine residues from the interior surfaces of a CVD reactor

   
   

In accordance with an embodiment of the present intention, a fluorine residue removing method includes: supplying an oxygen-containing gas and a hydrogen-containing gas into a CVD chamber; producing a plasma of a mixture of the oxygen-containing gas and the-hydrogen containing gas, so that the plasma reacts with the fluorine residue, exothermically generating water; and evacuating from the CVD chamber a product of the reaction between the plasma and the fluorine residue. For the hydrogen-containing gas, NH.sub.3 is often used, and for the oxygen-containing gas, N.sub.2 O, O.sub.2, or air is used. Exemplary mixtures of the oxygen-containing and the hydrogen-containing gases include 70 mol % N.sub.2 O/NH.sub.3, 50 mol % N.sub.2 O/NH.sub.3, and 52 mol % O.sub.2 /NH.sub.3. An inert gas, such as He, Ne, Ar, or Kr, can be optionally supplied into the chamber to stabilize the plasma.

De acuerdo con una encarnación de la actual intención, un método que quita del residuo del flúor incluye: proveer un gas oxi'geno-que contiene y un gas hidro'geno-que contiene en un compartimiento del CVD; produciendo un plasma de una mezcla del gas y del-HIDRO'GENO oxi'geno-que contienen que contienen el gas, de modo que el plasma reaccione con el residuo del flúor, exotérmico generando el agua; y evacuando del compartimiento del CVD un producto de la reacción entre el plasma y el residuo del flúor. Para el gas hidro'geno-que contiene, NH.sub.3 se utiliza a menudo, y para el gas oxi'geno-que contiene, se utiliza N.sub.2 O, O.sub.2, o el aire. Las mezclas ejemplares de los gases oxi'geno-que contienen e hidro'geno-que contienen incluyen 70 mol de % de N.sub.2 O/NH.sub.3, 50 mol de % de N.sub.2 O/NH.sub.3, y 52 mol de % de O.sub.2 /NH.sub.3. Un gas inerte, tal como él, Ne, Ar, o Kr, puede ser provisto opcionalmente en el compartimiento para estabilizar el plasma.

 
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