Polymer, chemically amplified resist composition and patterning process

   
   

Polymers comprising recurring units of cycloolefin having fluorinated alkyl introduced therein are novel and have transparency and alkali solubility. Using the polymers, resist compositions featuring low absorption of F.sub.2 excimer laser light are obtained.

De polymeren die uit terugkomende eenheden van cycloolefin bestaan die fluorinated daarin geïntroduceerd alkyl heeft zijn nieuw en hebben transparantie en alkalioplosbaarheid. Gebruikend de polymeren, verzet me tegen samenstellingen die lage absorptie van excimer F.sub.2 laserlicht kenmerken worden verkregen.

 
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> Process for forming vinyl ester from carboxylic acid with water treatment of the reaction mixture

> C-nitrosoaniline compounds and their blends as polymerization inhibitors

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