Resist compositions and patterning process

   
   

A resist composition comprising as the base resin a blend of a fluorinated polymer which is sensitive to high-energy radiation and highly transparent at a wavelength of up to 200 nm and a sulfonate-containing polymer exhibiting a high contrast upon alkali dissolution is improved in transparency and alkali dissolution contrast as well as plasma etching resistance.

Состав сопротивлять состоя из как низкопробная смолаа бленда fluorinated полимера чувствительно к с высокой энергией радиации и высоки прозрачно на длине волны up to 200 nm и сульфонат-soderja полимер exhibiting высокий контраст на растворении алкалиа улучшен в контрасте растворения транспаранта и алкалиа так же, как сопротивление вытравливания плазмы.

 
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