The invention relates to optical engineering, in particular to methods for
measuring a microrelief, the distribution of optical material constants
of a near-surface layer and can be used for microelectronic engineering,
nanotechnology, material science, medicine and biology. The aim of the
invention is to improve spatial resolution for mearsuring geometrical
parameters of the relief and the distribution of the optical material
constants, extend the range of defined constants including optical
anisotropy constants, significantly increasing the accuracy of definition
of the material constant and extending the number of objects studied. The
inventive method for measuring microrelief and optical characteristics of
the near-surface layer and a modulation interference microscope for
carrying out said method are also disclosed.
