Photosensitive polymer containing silicon and a resist composition using the same

   
   

A photosensitive polymer including silicon and a resist composition using the same are disclosed. The photosensitive polymer has the following formula 1. ##STR1## In formula 1, R.sub.1 of the first monomer and R.sub.3 of the third monomer are an alkyl group. R.sub.2 of the first monomer is hydrogen, alkyl, alkoxy, or carbonyl. The X of the first monomer is an integer selected from 1 to 4. Further, m/(m+n+p) is about 0.1 to about 0.4, n/(m+n+p) is about 0.1 to about 0.5, and p/(m+n+p) is about 0.1 to about 0.4.

Um polímero photosensitive including o silicone e uma composição resistir que usa o mesmo são divulgados. O polímero photosensitive tem a seguinte fórmula 1. ## do ## STR1 Na fórmula 1, R.sub.1 do primeiro monomer e R.sub.3 do terceiro monomer são um grupo alkyl. R.sub.2 do primeiro monomer é hidrogênio, alkyl, alkoxy, ou carbonyl. O X do primeiro monomer é um inteiro selecionado de 1 a 4. Mais mais, m/(m+n+p) são aproximadamente 0.1 a aproximadamente 0.4, n/(m+n+p) são aproximadamente 0.1 a aproximadamente 0.5, e p/(m+n+p) são aproximadamente 0.1 a aproximadamente 0.4.

 
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