Low-silanol silica

   
   

A silylated silica having an SiOH density per nm.sup.2 of less than 0.6, based on the BET-method surface area (DIN 66131 and 66132), is prepared by silylating silica in a process where loading, reacting, and purifying are performed in separate steps.

Silylated кремнезем имея плотность SiOH в nm.sup.2 меньш чем 0.6, основанное на зоне Держать пари-metoda поверхностной (din 66131 и 66132), подготовлен путем silylating кремнезем в процессе где нагружающ, реагирующ, и очищающ выполните в отдельно шагах.

 
Web www.patentalert.com

< Crystals comprising single-walled carbon nanotubes

< Nickel hydroxide coated with cobaltous hydroxide

> Process for producing anionic clay using boehmite which has been peptized with an acid

> Expandable structure

~ 00135