The performance of a plasma processing apparatus which is disassembled,
transferred, and reassembled is evaluated. The plasma processing apparatus
has a plasma processing chamber having an electrode for exciting a plasma,
a radiofrequency generator connected to the electrode, and an impedance
matching circuit for performing the impedance matching between the plasma
processing chamber and the radiofrequency generator. The performance of
the apparatus is evaluated whether or not three times the first series
resonant frequency of the plasma processing chamber is larger than the
power frequency supplied to the plasma processing chamber.
