Fluorinated polymers, photoresists and associated processes for
microlithography are described. These polymers and photoresists are
comprised of a fluoroalcohol functional group which simultaneously imparts
high ultraviolet (UV) transparency and developability in basic media to
these materials. The materials of this invention have high UV transparecy,
particularly at short wavelengths, e.g., 157 nm, which makes them highly
useful for lithography at these short wavelengths.
