Photosensitive polymers and resist compositions comprising the photosensitive polymers

   
   

A photosensitive polymer of a resist composition includes a copolymer of alkyl vinyl ether containing silicon and maleic anhydride, represented by the following formula: ##STR1## where R.sub.1 is --H, --OSi(CH.sub.3).sub.2 C(CH.sub.3).sub.3 or --OSi(CH.sub.3).sub.3 ; R.sub.2 is --H, --OH, --OCOCH.sub.3, --OSi(CH.sub.3).sub.2 C(CH.sub.3).sub.3 or --OSi(CH(CH.sub.3).sub.2).sub.3 ; R.sub.3 is --H, --OH or --OCOCH.sub.3 ; R.sub.4 is --H, --OSi(CH.sub.3).sub.2 C(CH.sub.3).sub.3, --CH.sub.2 OSi(CH.sub.3).sub.2 C(CH.sub.3).sub.3 or --CH.sub.2 OSi(CH(CH.sub.3).sub.2).sub.3 ; and at least one of R.sub.1, R.sub.2, R.sub.3 and R.sub.4 is a Si-containing group.

 
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