A method and structure for an electrode device, whereby a second electrode
is deposited on a first electrode such that there is an increase in the
capacitive coupling between the pair of conductive electrodes. The
electrodes are self-aligning such that the patterning manufacturing
process is insensitive to variations in the positional placement of the
pattern on the substrate. Moreover, a single lithographic masking layer is
used for forming the pair of electrodes, which are electrically isolated.
Finally, the first electrode is offset from the second electrode by a
chemical surface modification of the first electrode, and an anisotropic
deposition of the second electrode which is shadowed by the first
electrode.
