Compounds of formulae I, II or III
##STR1##
##STR2##
##STR3##
wherein m is zero or 1; n is 1, 2 or 3; R.sub.1 inter alia is unsubstituted
or substituted phenyl, or naphthyl, anthracyl, phenanthryl, a heteroaryl
radical, or C.sub.2 -C.sub.12 alkenyl; R'.sub.1 inter alia is vinylene,
phenylene, naphthylene, diphenylene or oxydiphenylene; R.sub.2 inter alia
is CN, C.sub.1 -C.sub.4 haloalkyl, C.sub.2 -C.sub.6 alkoxycarbonyl,
phenoxycarbonyl, or benzoyl; R.sub.3 inter alia is C.sub.1 -C.sub.18
alkylsulfonyl, phenyl-C.sub.1 -C.sub.3 alkylsulfonyl, camphorylsulfonyl,
or phenylsulfonyl; R'.sub.3 inter alia is C.sub.2 -C.sub.12
alkylenedisulfonyl, phenylenedisulfonyl, naphthylenedisulfonyl,
diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; R.sub.4 and R.sub.5
inter alia are hydrogen, halogen, C.sub.1 -C.sub.8 alkyl, C.sub.1 -C.sub.6
alkoxy, C.sub.1 -C.sub.4 haloalkyl, CN, NO.sub.2, C.sub.2 -C.sub.6
alkanoyl, benzoyl, phenyl, --S-phenyl, OR.sub.6, SR.sub.9, NR.sub.7
R.sub.8, C.sub.2 -C.sub.6 alkoxycarbonyl or phenoxycarbonyl; R.sub.6 inter
alia is hydrogen, phenyl or C.sub.1 -C.sub.12 alkyl; R.sub.7 and R.sub.8
inter alia are hydrogen or C.sub.1 -C.sub.12 alkyl; R.sub.9 inter alia is
C.sub.1 -C.sub.12 alkyl; R.sub.10, R.sub.11 and R.sub.12 inter alia are
C.sub.1 -C.sub.6 alkyl or phenyl; upon irradiation react as acid
generating compounds and thus are suitable in photoresist applications.
