The present invention is directed to a process for depositing at least one
layer (3) based on tungsten and/or on molybdenum by chemical vapor
deposition on a non-conductive substrate (1), such as glass, ceramic,
glass-ceramic, or polymer, which includes providing at least one tungsten-
and/or molybdenum-containing precursor in the form of a metal halide
and/or of an organometallic compound, and at least one reducing agent,
such as hydrogen or silane, to form the at least one metal layer. The
present invention also relates to the substrate obtained by the preceding
process and its applications, especially for producing a glazing, mirrors,
or emissive screens.
