Method for selective chemical vapor deposition of nanotubes

   
   

A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.

_ um método fabricating um nanotube estrutura que inclu providing um carcaça, providing um máscara região positioned carcaça, patterning e gravura a água-forte através máscara região formulário ao menos um trincheira, depositing um condutor material camada dentro ao menos um trincheira, depositing um solvente based nanoparticle catalizador condutor material camada dentro ao menos um trincheira, removing máscara região e subseqüente camada cresç thereon using um lift-off processo, e forming ao menos um nanotube elétrico conect condutor material camada using produto vapor deposition com um methane precursor. _

 
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