A photosensitive polymer which maintains transparency even when exposed to a short-wavelength light source of 193 nm or below, exhibits improved adhesiveness to a substrate, improved contrast and improved resistance to dry etching. The photosensitive polymer includes a first monomer which is alicyclic hydrocarbon carboxylate having an acid-labile C.sub.6 to C.sub.20 tertiary alicyclic hydrocarbon group as a substituent, and a second monomer which is capable of free radical polymerization.

Un polímero fotosensible que mantiene la transparencia incluso cuando está expuesto a una fuente de luz short-wavelength de 193 nm o abajo, exhibe adherencia mejorada a un substrato, contraste mejorado y resistencia mejorada a la aguafuerte seca. El polímero fotosensible incluye un primer monomer que sea carboxylate alicyclic del hidrocarburo que tiene un C.sub.6 a'cido-acid-labile al grupo alicyclic terciario del hidrocarburo C.sub.20 como sustituto, y un segundo monomer que sea capaz de la polimerización del radical libre.

 
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