There are provided a photosensitive polymer and a photoresist compositing containing the same. The photosensitive polymer is represented by the following formula: ##STR1## wherein R.sub.1 is an acid-labile tertiary alkyl ester group, R.sub.2 is hydrogen atom, methyl, ethyl, carboxyl, .gamma.-butyrolactone-2-yl ester, .gamma.-butyrolactone-3-yl ester, pantolactone-2-yl ester, mevalonic lactone ester, 3-tetrahydrofuranyl ester, 2,3-propylenecarbonate-1-yl ester, 3-methyl-.gamma.-butyrolactone-3-yl ester or C.sub.3 to C.sub.20 alicyclic hydrocarbon, a/(a+b+c) is 0.1.about.0.7, b/(a+b+c) is 0.1.about.0.8, c/(a+b+c) is 0.0.about.0.8, and n is an integer in the range of 0 to 2.

 
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