The present invention relates to a system and a method for
microlithographic writing on photosensitive substrates, and specially
printing of patterns with extremely high precision, such as photomasks for
semiconductor device patterns, display panels, integrated optical devices
and electronic interconnect structures. The system comprises a light
source (1), preferably a laser, a computer-controlled light modulator (3)
and a lens to contract the at least one light beam from the light source
before it reaches the substrate. Further it comprises a device for
controlling the position of incidence of the beam on the substrate, a
detector for detecting the deviation from the intended position of
incidence of the beam on the substrate, and correcting device for
controlling the position controlling to device in accordance with the
detected deviation diminish position errors at the substrate related to
the deviations.